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High-speed circuits based on thin film transistors (TFTs) show promising potential applications in biomedical imaging and human-machine interactions. One of the critical requirements for high-speed electronic devices lies in high-frequency switching or amplification at low voltages, typically driven by batteries (∼3.0 V). To date, however, most electrical performances of metal oxide TFTs are measured under direct current (DC) conditions, and their dynamic switching behaviour is scarcely explored and studied systematically. Here in this work, we present low voltage-driven, high-performance TiO thin film transistors, which can be operated at a switching speed of MHz. Our proposed TiO TFTs demonstrated a high on-off ratio of 10, together with a subthreshold swing (SS) of ∼150 mV Dec averaged over four orders of magnitude, which can be further reduced below 100 mV Dec when the temperature cools to 77 K. Additionally, the TiO TFTs exhibit excellent gate-pulse switching at various frequencies ranging from 1.0 Hz to 1.0 MHz. We also explored the potential application of the TiO TFTs as logic gates by constructing a resistive-loaded inverter, which shows stable operation at 10 kHz frequency and various temperatures. Thus, our results show the great potential of TiO TFTs as a new platform for high-speed electronic applications.
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http://dx.doi.org/10.1039/d3ra08447g | DOI Listing |
ACS Appl Mater Interfaces
September 2025
Department of Material Sciences and Engineering, Seoul National University, Seoul 08826, Republic of Korea.
A nanometer-scale multilayer gate insulator (GI) engineering strategy is introduced to simultaneously enhance the on-current and bias stability of amorphous InGaZnO thin-film transistors (a-IGZO TFTs). Atomic layer deposition supercycle modifications employ alternating layers of AlO, TiO, and SiO to optimize the gate-oxide stack. Each GI material is strategically selected for complementary functionalities: AlO improves the interfacial quality at both the GI/semiconductor and GI/metal interfaces, thereby enhancing device stability and performance; TiO increases the overall dielectric constant; and SiO suppresses leakage current by serving as a high-energy barrier between AlO and TiO.
View Article and Find Full Text PDFMicromachines (Basel)
November 2024
Southwest Institute of Technology and Engineering, Chongqing 400039, China.
High-k metal oxides are gradually replacing the traditional SiO dielectric layer in the new generation of electronic devices. In this paper, we report the production of five-element high entropy metal oxides (HEMOs) dielectric films by solution method and analyzed the role of each metal oxide in the system by characterizing the film properties. On this basis, we found optimal combination of (AlGaTiYZr)O with the best dielectric properties, exhibiting a low leakage current of 1.
View Article and Find Full Text PDFACS Appl Mater Interfaces
September 2024
Department of Electrical and Computer Engineering, University of Delaware, Newark, Delaware 19716, United States.
Oxide semiconductor thin-film transistors (TFTs) have shown great potential in emerging applications such as flexible displays, radio-frequency identification tags, sensors, and back-end-of-line compatible transistors for monolithic 3D integration beyond their well-established flat-plane display technology. To meet the requirements of these appealing applications, high current drivability is essential, necessitating exploration in materials science and device engineering. In this work, we report for the first time on a simple solution-based superacid (SA) treatment to enhance the current drivability of top-gate TiO TFTs with a gate-offset structure.
View Article and Find Full Text PDFRSC Adv
February 2024
Department of Chemistry, School of Chemistry and Chemical Engineering and Environment, Minnan Normal University Zhangzhou 36300 China
Environ Sci Pollut Res Int
January 2021
Department of Physics, Savitribai Phule Pune University (formerly University of Pune), Pune, 411007, India.
ZnO and ZnO:Al thin films have been successfully synthesized by simple solution processable method at low temperature. Highly crystalline (002) preferentially oriented, uniform, and smooth ZnO:Al thin films are produced. The electrical, J-V and C-V, measurements revealed higher current flow and more carrier concentration, respectively, for ZnO:Al samples compared with pristine ZnO.
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