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High-In-content InGaN quantum wells (QWs) in red light-emitting diodes (LEDs) are typically grown at low temperatures to ensure effective In incorporation. In this study, red LEDs based on bulk InGaN active region were demonstrated. The growth temperature of bulk InGaN was ∼800℃, which is over 100℃ higher than the typical growth temperature of red QWs. By introducing high-density trench structures in the underlying green multi-quantum wells (MQWs), the compressive strain in bulk InGaN was relaxed by ∼96%. With strain relaxation, phase separation occurred in the bulk InGaN, forming low-In-content (blue) and high-In-content (red) phases. The red phase acted as carrier localization centers, enabling red light emission under electrical injection. The red LEDs based on bulk InGaN active region exhibited superior wavelength stability, with the peak wavelength shifting slightly from 648.6 nm at 1 mA to 642.4 nm at 100 mA. Meanwhile, the on-wafer peak external quantum efficiency was measured to be 0.32%. To the best of our knowledge, this study presents a new epitaxial strategy for red InGaN LEDs.
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http://dx.doi.org/10.1364/OE.566890 | DOI Listing |
Nanoscale
August 2025
Department of Physics, College of Science, United Arab Emirates University, Al-Ain, Abu Dhabi, P. O. Box 15551, United Arab Emirates.
Electrochemical etching (ECE) has become an essential approach for nanostructuring III-nitride semiconductors, offering precise, scalable control over their physical and functional characteristics. Through ECE, bulk materials such as GaN, InN, and InGaN can be engineered into zero-dimensional nanoparticles, one-dimensional nanowires, and two-dimensional porous frameworks. These nanostructures exhibit enhanced optoelectronic behavior, superior charge transport, and increased surface area properties that make them highly effective at photodetection and gas sensing.
View Article and Find Full Text PDFHigh-In-content InGaN quantum wells (QWs) in red light-emitting diodes (LEDs) are typically grown at low temperatures to ensure effective In incorporation. In this study, red LEDs based on bulk InGaN active region were demonstrated. The growth temperature of bulk InGaN was ∼800℃, which is over 100℃ higher than the typical growth temperature of red QWs.
View Article and Find Full Text PDFACS Appl Electron Mater
June 2025
Institute of High Pressure Physics Polish Academy of Sciences, PAS, 01-142 Warsaw, Poland.
The development of complex optoelectronic devices often necessitates efficient and high-quality visible light sources. The gallium nitride (GaN) material family, widely used in constructing light-emitting diodes for general lighting, is an obvious choice for this purpose, but the highest quality devices need to be obtained on native substrates. In this study, we demonstrate the fabrication of LEDs on bulk GaN substrates, which are compatible with microtransfer printing (μTP) technology, enabling integration onto foreign wafers.
View Article and Find Full Text PDFLow-In-content InGaN bulk layers are widely used in GaN-based LDs, LEDs, and vertical p-n diodes. However, studies on point defects in InGaN bulk layers are still relatively rare. Due to their thin thickness when grown on GaN template layers, methods for characterizing point defects in unintentionally doped InGaN bulk layers are lacking.
View Article and Find Full Text PDFACS Appl Mater Interfaces
March 2025
Electrical & Computer Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706, United States.
An up to 40% relaxed N-polar InGaN pseudosubstrate was obtained by a multistep in situ porosification technique on the N-polar GaN template using the metal-organic chemical vapor deposition (MOCVD) method. An InGaN/InGaN/GaN superlattice (SL) layer (SL) with a higher composition of InGaN ( = 15.2%) compared to InGaN ( = 8.
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