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Van der Waals ferroelectric CuInPS (CIPS) has emerged as a compelling candidate for multifunctional electronic devices, attributed to its intrinsic multiple polarization states and the coupling of these states with highly active Cu ions migration. Such a "ferroionic" feature of CIPS opens a new paradigm for the next-generation multifunctional ferroelectric devices. Here, we present a comprehensive investigation of n-Si/CIPS/MoS ferroelectric semiconductor junction (FSJ) devices, focusing on the interplay between ferroelectric polarization and ionic migration. By employing high-resolution piezoresponse force microscopy and conductive atomic force microscopy imaging and spectroscopy methods, we revealed the distinctive dual and quadruple polarization states of the FSJ, which give rise to distinct memristive and rectifying electronic behaviors, respectively. The dual-polarization FSJ exhibits voltage- and frequency-dependent current-voltage hysteresis, while the quadruple-polarization FSJ achieves a rectification ratio exceeding 10, which can be attributed to Cu ion migration correlated with ferroelectric polarization modulation. This work establishes an effective strategy for leveraging ferroelectric-ionic coupling to achieve multifunctional device performance, paving the way for advanced electronic systems through interfacial engineering in future non-volatile memories and neuromorphic computing applications.
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http://dx.doi.org/10.1039/d5nr01908g | DOI Listing |
ACS Nano
September 2025
Key Laboratory of Artificial Micro- and Nano-Structures of Ministry of Education, and School of Physics and Technology, Wuhan University, Wuhan 430072, China.
Ferroelectric tunnel junctions (FTJs) based on ferroelectric switching and quantum tunneling effects with thickness down to a few unit cells have been explored for applications of two-dimensional (2D) electronic devices in data storage and neural networks. As a key performance indicator, the enhanced tunneling electrosistance (TER) ratio provides a broader dynamic range for precise modulation of synaptic weights, improving the stability and accuracy of neural networks. Herein, we report an observation of pronounced enhancement in the TER ratio by over 4 orders of magnitude through the fabrication of large-scale heterostructures combining bismuth ferrite with two-dimensional Ruddlesden-Popper oxide BiFeO.
View Article and Find Full Text PDFNano Lett
September 2025
Department of Physics and Astronomy, University of Nebraska─Lincoln, Lincoln, Nebraska 68588, United States.
In this study, using a set of scanning probe microscopy techniques, we investigate the electronic properties of the domain walls in the layered ferroelectric semiconductor of the transition metal oxide dihalide family, NbOI. Although the uniaxial ferroelectricity of NbOI allows only 180° domain walls, the pristine 2D flakes, where polarization is aligned in-plane, typically exhibit a variety of as-grown domain patterns outlined by the electrically neutral and charged domain walls. The electrically biased probing tip can modify the as-grown domain structures.
View Article and Find Full Text PDFNano Lett
September 2025
School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, China.
Multijunction photoelectrodes, which generate active photocarriers with sufficient energy to drive unassisted solar-fuel conversion, represent a promising avenue for sustainable energy applications. However, achieving controllable p/n-type doping and high-quality growth remains a challenge for most emerging metal oxide semiconductors. In this study, we demonstrate the creation of in-plane ferroelectric p/n homojunction superstructures in BiFeO (BFO) films, enabling bias-free photoelectrochemical (PEC) reactions.
View Article and Find Full Text PDFAdv Mater
September 2025
Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China.
Atomically thin 2D layered ferroelectric semiconductors, where polarization switching transpires within the channel material itself, are pivotal to advancing the next generation of high-performance electronics. Nevertheless, the challenge remains in either the controllable synthesis of films or the manipulation of associated ferroelectricity. Here, 2D p-type BiCuSeO (BCSO) films with a thickness down to ≈3 nm are successfully synthesized using molecular beam epitaxy.
View Article and Find Full Text PDFNano Lett
September 2025
Department of Electrical and Systems Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States of America.
Wurtzite nitride ferroelectric materials have emerged as promising candidates for next-generation memory applications, due to their exceptional polarization properties and compatibility with conventional semiconductor processing techniques. Here, we demonstrate the first successful areal scaling of aluminum scandium nitride (AlScN) ferroelectric diode (FeDiode) memory down to device diameter of 40 nm while maintaining an ON/OFF ratio of >60. Using a 20-nm-thick AlScN ferroelectric layer, we evaluate both metal-insulator-ferroelectric-metal (MIFM) and metal-ferroelectric-metal (MFM) architectures for scaled resistive memory devices.
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