Improvement of the Stability of Quantum-Dot Light Emitting Diodes Using Inorganic HfO Hole Transport Layer.

Materials (Basel)

Department of Advanced Materials Engineering for Information and Electronics, Kyung Hee University, Yongin 17104, Republic of Korea.

Published: September 2024


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Article Abstract

One of the major challenges in QLED research is improving the stability of the devices. In this study, we fabricated all inorganic quantum-dot light emitting diodes (QLEDs) using hafnium oxide (HfO) as the hole transport layer (HTL), a material commonly used for insulator. Oxygen vacancies in HfO create defect states below the Fermi level, providing a pathway for hole injection. The concentration of these oxygen vacancies can be controlled by the annealing temperature. We optimized the all-inorganic QLEDs with HfO as the HTL by changing the annealing temperature. The optimized QLEDs with HfO as the HTL showed a maximum luminance and current efficiency of 66,258 cd/m and 9.7 cd/A, respectively. The fabricated all-inorganic QLEDs exhibited remarkable stability, particularly when compared to devices using organic materials for the HTL. Under extended storage in ambient conditions, the all-inorganic device demonstrated a significantly enhanced operating lifetime (T) of 5.5 h, which is 11 times longer than that of QLEDs using an organic HTL. These results indicate that the all-inorganic QLEDs structure, with ITO/MoO/HfO/QDs/ZnMgO/Al, exhibits superior stability compared to organic-inorganic hybrid QLEDs.

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http://www.ncbi.nlm.nih.gov/pmc/articles/PMC11477746PMC
http://dx.doi.org/10.3390/ma17194739DOI Listing

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