A close atomic surface of stainless steel produced by novel green chemical mechanical polishing using silica and lanthana mixed abrasives.

Stainless steel poses machining challenges due to its corrosion and wear resistance. Traditional chemical mechanical polishing (CMP) often involves using noxious slurries, resulting in environmental risks. Moreover, surface roughness Sa is normally higher than 0.

Atomic level surface roughness of epoxy resin induced by novel chemical mechanical polishing with high material removal rate and its mechanisms elucidated using molecular dynamics simulations and density functional theory.

Epoxy resins are widely used in the coating, adhesive and electronics industries. However, it is a difficult-to-machine polymer owing to its nature of thermal softening and soft-plastic and corrosion resistance characteristics. To overcome these difficulties, surface roughness () is usually set at more than 4 nm, and material removal rate (MRR) is normally set lower than 2 μm h during traditional chemical mechanical polishing (CMP).

Close atomic surface on aluminum alloy achieved by a near-neutral novel green chemical mechanical polishing method with high material removal rate.

Scratches, embedding of abrasives, and corrosion pits easily occur on the surface of aluminum (Al) alloy during traditional mechanical and chemical mechanical polishing (CMP). To achieve a close atomic surface on Al alloy, the material removal rate (MRR) is generally extremely low. To address these challenges, a near-neutral, novel green CMP slurry with a pH value of 6 was developed for Al alloy, consisting of silica, praseodymia, hydrogen peroxide, triethanolamine, and niacin.

Development of a Novel Water Jet Polisher Using Soft Abrasives for Small Complex-Structure Heat Pipes of Aluminum Alloy Produced Using Additive Manufacturing.

It is a challenge to polish the interior surface of a small bent pipe with complex structures and sizes less than 0.5 mm. This is because of the fact that traditional polishing methods could destroy, block, or break the small complex structures.

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Autoimmune uveitis (AU) is a kind of immune-mediated disease resulting in irreversible ocular damage and even permanent vision loss. However, the precise mechanism underlying dynamic immune changes contributing to disease initiation and progression of AU remains unclear. Here, we induced an experimental AU (EAU) model with IRBP and found that day[D]14 was the inflammatory summit with remarking clinical and histopathological manifestations and the activation of retinal microglia exhibited a time-dependent pattern in the EAU course.

Atomic surface of quartz glass induced by photocatalytic green chemical mechanical polishing using the developed SiO@TiO core-shell slurry.

High-performance devices of quartz glass demand an atomic surface, which induces a challenge for chemical mechanical polishing (CMP) with a high material removal rate (MRR). Moreover, traditional CMP usually employs toxic and corrosive slurries, leading to the pollution of the environment. To overcome these challenges, a novel green photocatalytic CMP is proposed.

Atomic surface achieved through a novel cross-scale model from macroscale to nanoscale.

Chemical mechanical polishing (CMP) is widely used to achieve an atomic surface globally, yet its cross-scale polishing mechanisms are elusive. Moreover, traditional CMP normally employs toxic and corrosive slurries, resulting in potential pollution to the environment. To overcome these challenges, a novel cross-scale model from the millimeter to nanometer scale is proposed, which was confirmed by a newly developed green CMP process.

Unprecedented atomic surface of silicon induced by environmentally friendly chemical mechanical polishing.

Silicon (Si) dominates the integrated circuit (IC), semiconductor, and microelectronic industries. However, it is a challenge to achieve a sub-angstrom surface of Si. Chemical mechanical polishing (CMP) is widely used in the manufacturing of Si, while toxic and polluted slurries are usually employed in CMP, resulting in pollution to the environment.

N6-methyladenosine demethylase FTO regulates inflammatory cytokine secretion and tight junctions in retinal pigment epithelium cells.

Objective: Uveitis is an intraocular inflammatory disease. Epigenetics has been associated with its pathogenesis. However, the role of N6-methyladenosine (m6A) in uveitis has not been reported.

Small molecules targeting RORγt inhibit autoimmune disease by suppressing Th17 cell differentiation.

Th17 cells, a lymphocyte subpopulation that is characterized by the expression of the transcription factor "retinoic acid receptor-related orphan receptor gamma-t" (RORγt), plays an important role in the pathogenesis of autoimmune disease. The current study was set up to discover novel and non-steroidal small-molecule inverse agonists of RORγt and to determine their effects on autoimmune disease. Structure-based virtual screening (SBVS) was used to find compounds targeting RORγt.