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Ion intercalation offers a versatile method for dynamically tuning the infrared emissivity of multilayer graphene (MLG), with great potential in various applications, such as radiative cooling and thermal camouflage. However, the practical use of MLG-based emissivity modulators is limited by poor wavelength selectivity and short operational lifespans. Herein, a silicon overlayer is introduced to address these challenges. By controlling the thickness of the silicon overlayer, selective wavelength emissivity across mid-wave and long-wave infrared bands is achieved through interference effects and plasmonic resonance without compromising the capability for emissivity modulation via ion intercalation through electrostatic gating. Furthermore, the silicon overlayer significantly prolongs the device's lifespan by preventing oxidation and maintaining the structural integrity of MLG. These results present an approach to integrating optical engineering with dynamic emissivity modulation, paving the way for developing practical wavelength-selective emissivity modulators.
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http://dx.doi.org/10.1364/OE.554948 | DOI Listing |
Ion intercalation offers a versatile method for dynamically tuning the infrared emissivity of multilayer graphene (MLG), with great potential in various applications, such as radiative cooling and thermal camouflage. However, the practical use of MLG-based emissivity modulators is limited by poor wavelength selectivity and short operational lifespans. Herein, a silicon overlayer is introduced to address these challenges.
View Article and Find Full Text PDFJ Am Chem Soc
August 2025
Department of Chemistry, The University of Texas at Austin, Austin, Texas 78712, United States.
The properties of semiconductor|liquid interfaces play a critical role in determining the efficiency of solar-to-hydrogen (STH) conversion. Here, we investigate how molecular functionalization of Si(111) and Si(111)|TiO surfaces impacts photoelectrochemical (PEC) hydrogen production efficiency. We find that functionalization of ∼3% of the atop sites of Si(111) with either 9-anthracene (Anth) or 5-tetracene (Tet), with the remaining sites passivated by methyl groups, provides substrates with high electronic quality and low surface oxide densities, as determined by X-ray photoelectron spectroscopy (XPS) measurements.
View Article and Find Full Text PDFAngew Chem Int Ed Engl
July 2025
Center of Electron Microscopy and State Key Laboratory of Silicon and Advanced Semiconductor Materials, School of Materials Science and Engineering, Zhejiang University, Hangzhou, 310027, China.
Strong metal-support interaction (SMSI) plays a crucial role in catalysis, with its encapsulation configuration being highly dependent on the chemical environments. However, the dynamic behavior of SMSI under redox conditions remains insufficiently understood. Here, environmental transmission electron microscopy (ETEM) revealed that SMSI overlayers form stably on the surface of Pd/TiO nanocatalysts under pure O and pure H conditions, and exhibit oscillatory behavior under a redox condition with a 5:1 O/H ratio at 0.
View Article and Find Full Text PDFAdv Sci (Weinh)
May 2025
Department of Gastroenterology and Hepatology, Digestive Endoscopy Medical Engineering Research Laboratory, West China Hospital, Med-X Center for Materials, Sichuan University, Chengdu, 610064, P. R. China.
Wound postoperative infection and adhesion are prevalent clinical conditions resulting from surgical trauma. However, integrating intraoperative repair and postoperative management into a dressing suitable for wounds with unpredictable surface shapes and surroundings remains a formidable challenge. Here, we attempt to introduce a dynamic antifouling surface as wound protective covering and report an in situ formation of slippery-adhesive Janus gel (SAJG) by assembling hydrogel (N-hydrosuccinimide ester-activated powders) and elastomer (Silicon oil-infused polydimethylsiloxane).
View Article and Find Full Text PDFPhys Chem Chem Phys
November 2024
Advanced Research Center for Nanolithography, Science Park 106, Amsterdam 1098 XG, The Netherlands.
This work investigates the interaction of silicon with ruthenium, extending from Si-defect centers in ruthenium bulk to the adsorption of Si on the Ru(0001) surface. Using density functional theory (DFT) we calculate the interaction energies of up to 2 monolayers (MLs) of Si with this surface, uncovering the initial formation of ruthenium silicide (RuSi). Our results demonstrate that Si readily forms substitutional defects (Si) in bulk ruthenium.
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