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Optically addressable light valves based on wide bandgap 4H- and 6H-SiC as photoconductors were designed to withstand higher operational laser fluences than the state-of-the-art bismuth silicon oxide (BSO; )-based devices. Vanadium-doped SiC was selected as the photoconductor due to its reasonable photoresponsivity while many-fold improvement in laser-induced damage threshold as compared to BSO. The laser-induced damage threshold values of the materials were measured after exposing ∼200 sites on the samples to increasing levels of fluence of a Gaussian pulsed Nd:YAG laser system (1064 nm) with a 5 Hz repetition rate. The measured damage threshold values for BSO, 4H-, and 6H-SiC were 0.4, 1.75, and 1.8/, respectively. Photoconductive switches based on 4H- and 6H-SiC samples were characterized at wavelengths of 380, 405, and 447 nm. The peak photoresponsivity values of the 4H- and 6H-SiC materials were measured to be under 380 and 405 nm, respectively. The photoconductor was bonded to a BK7 optical window with 5 µm diameter microspheres as spacers. A twisted nematic type E7 liquid crystal (LC) was filled in the 5 µm gap in a vacuum chamber. The desired alignment of the liquid crystal was achieved by mutually orthogonal orientation of LC alignment layers on the two mating faces (SiC and BK7). The fabricated devices were modulated using address beams of wavelengths 380, 405, and 447 nm. Required transmission levels of >90 were achieved for the fabricated OALVs for a sinusoidal voltage waveform that meets the lifetime requirement of the device.
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http://dx.doi.org/10.1364/AO.540656 | DOI Listing |
Optically addressable light valves based on wide bandgap 4H- and 6H-SiC as photoconductors were designed to withstand higher operational laser fluences than the state-of-the-art bismuth silicon oxide (BSO; )-based devices. Vanadium-doped SiC was selected as the photoconductor due to its reasonable photoresponsivity while many-fold improvement in laser-induced damage threshold as compared to BSO. The laser-induced damage threshold values of the materials were measured after exposing ∼200 sites on the samples to increasing levels of fluence of a Gaussian pulsed Nd:YAG laser system (1064 nm) with a 5 Hz repetition rate.
View Article and Find Full Text PDFLangmuir
June 2024
School of Materials Science and Engineering, Central South University, Changsha 410083, China.
Silicon carbide, as a third-generation semiconductor material, plays a pivotal role in various advanced technological applications. Its exceptional stability under extreme conditions has garnered a significant amount of attention. These superior characteristics make silicon carbide an ideal candidate material for high-frequency, high-power electronic devices and applications in harsh environments.
View Article and Find Full Text PDFMaterials (Basel)
December 2023
Center on Nanoenergy Research, Guangxi Colleges and Universities Key Laboratory of Blue Energy and Systems Integration, Carbon Peak and Neutrality Science and Technology Development Institute, School of Physical Science & Technology, Guangxi University, Nanning 530004, China.
Interatomic potentials play a crucial role in the molecular dynamics (MD) simulation of silicon carbide (SiC). However, the ability of interatomic potentials to accurately describe certain physical properties of SiC has yet to be confirmed, particularly for hexagonal SiC. In this study, the mechanical, thermal, and defect properties of four SiC structures (3C-, 2H-, 4H-, and 6H-SiC) have been calculated with multiple interatomic potentials using the MD method, and then compared with the results obtained from density functional theory and experiments to assess the descriptive capabilities of these interatomic potentials.
View Article and Find Full Text PDFJ Phys Condens Matter
August 2023
School of Materials and Chemical Technology, Tokyo Institute of Technology, Yokohama, Kanagawa 226-8502, Japan.
Formation and electronic states of graphene nanoribbons with arm-chair edges (AGNR) are studied on the SiC(0001) vicinal surfaces toward the [11-00] direction. The surface step and terrace structures of both 4H and 6H-SiC substrates are used as the growth templates of one-dimensional arrays of AGNRs, which are prepared using the carbon molecular beam epitaxy followed by hydrogen intercalation. A band gap is observed above the-band maximum by angle-resolved photoelectron spectroscopy (ARPES) for the both samples.
View Article and Find Full Text PDFSmall
April 2023
Department of Mechanical and Energy Engineering, Southern University of Science and Technology, Shenzhen, 518055, China.
Nanoporous single-crystal silicon carbide (SiC) is widely used in various applications such as protein dialysis, as a catalyst support, and in photoanodes for photoelectrochemical water splitting. However, the fabrication of nano-structured SiC is challenging owing to its extreme chemical and mechanical stability. This study demonstrates a highly-efficient, open-circuit electrolytic plasma-assisted chemical etching (EPACE) method without aggressive fluorine-containing reactants.
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