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The electrical performance of organic thin-film transistors (OTFTs) based on DNTT as the semiconductor active layer (DNTT, which stands for dinaphtho [2,3-b:2',3'-] thieno [3,2-] thiophene) is investigated and related to the structural properties of the organic films grown on SiO and Cytop substrates. Conventional current-voltage measurements and high-sensitivity low-frequency measurements show a lower mobility and correspondingly higher defect density for DNTT/SiO devices. Morphological and structural characterizations of DNTT films grown on the two dielectrics were performed using atomic force microscopy (AFM) and X-ray diffraction (XRD), revealing a highly ordered crystalline structure. Consistent with DFT simulation results, morphological analysis shows that the semiconductor films are layered, with DNTT molecules arranged with their longest axis perpendicular to the substrate. However, in only DNTT/SiO films, some molecules were found to be ordered and arranged parallel to the substrate. This "horizontal" orientation causes differences in charge transport properties in the semiconductor films grown on SiO, reducing the field-effect mobility. TCAD simulations indicate that this horizontal molecular orientation can be modeled as highly defective regions at semiconductor grain boundaries, consistent with low-frequency noise measurement results.
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http://dx.doi.org/10.1021/acsami.5c07824 | DOI Listing |
J Colloid Interface Sci
September 2025
College of Control Science and Engineering, China University of Petroleum (East China), Qingdao 266580, China. Electronic address:
Solid-liquid triboelectric nanogenerators (SL-TENGs) have attracted attention for use in water resource collection. However, traditional methods limit improvements in the surface energy density of the friction layer because of insufficient precision. This study used femtosecond laser technology to create three-dimensional bionic structures on polyvinylidene fluoride (PVDF) films.
View Article and Find Full Text PDFSmall
September 2025
Department of Materials Science, Chiba University, 1-33 Yayoi-cho, Inage-ku, Chiba, 263-8522, Japan.
1D electronic structures on 2D crystalline surfaces are crucial for investigating low-dimensional quantum phenomena and enabling the development of dimensionally engineered nanodevices. However, the inherent periodic symmetry of 2D atomic lattices generally leads to delocalized electronic band extending across the surface, making the creation of periodic 1D electronic states a significant challenge. Here, robust 1D electronic ordering is demonstrated in ultrathin Mn films grown on an atomically flat, non-reconstructed body-centered cubic Fe substrate.
View Article and Find Full Text PDFACS Nano
September 2025
Instituto de Ciencia de Materiales de Barcelona. ICMAB-CSIC. Campus Universitario UAB, Bellaterra 08193, Spain.
In this work, we investigate how the crystallographic growth direction influences spin current transmission in antiferromagnetic (AF) NiO thin films. By manipulating epitaxial growth, we explored the spin transport characteristics in LaSrMnO/NiO/Pt heterostructures grown on top of (001)- and (111)-oriented SrTiO substrates, varying the NiO barrier thickness (t). Spin currents were generated via spin pumping (SP), and detection was done by the inverse spin Hall effect (ISHE).
View Article and Find Full Text PDFNano Lett
September 2025
Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland.
Beyond single-photon emission, generating correlated -photon bundles, e.g., a photon pair, is essential for various quantum technologies including quantum teleportation and metrology.
View Article and Find Full Text PDFACS Appl Mater Interfaces
September 2025
Department of Materials Science and Chemical Engineering, Hanyang University, Ansan 15588, Republic of Korea.
With tris(dimethylamino)cyclopentadienyl metal (CpX(NMe)) precursors, the optimum process temperature of atomic layer deposition (ALD) is higher for HfO films (∼350 °C) than ZrO films (∼320 °C). Since simultaneous ALD of the two films is required in HfZrO film processes, the optimum ALD temperatures of the two films need to be adjusted equally. The cyclopentadienyl Zr precursor (MCPZr) introduced in this study exhibits better thermal stability than that of CpZr(NMe).
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