Severity: Warning
Message: file_get_contents(https://...@gmail.com&api_key=61f08fa0b96a73de8c900d749fcb997acc09&a=1): Failed to open stream: HTTP request failed! HTTP/1.1 429 Too Many Requests
Filename: helpers/my_audit_helper.php
Line Number: 197
Backtrace:
File: /var/www/html/application/helpers/my_audit_helper.php
Line: 197
Function: file_get_contents
File: /var/www/html/application/helpers/my_audit_helper.php
Line: 271
Function: simplexml_load_file_from_url
File: /var/www/html/application/helpers/my_audit_helper.php
Line: 3165
Function: getPubMedXML
File: /var/www/html/application/controllers/Detail.php
Line: 597
Function: pubMedSearch_Global
File: /var/www/html/application/controllers/Detail.php
Line: 511
Function: pubMedGetRelatedKeyword
File: /var/www/html/index.php
Line: 317
Function: require_once
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This paper reports the utilization of cost-effective bottom-contact electrodes composed of aluminum (Al) and titanium (Ti) to facilitate efficient electron injection in n-channel organic transistors. The optimized Al/Ti electrode has a low work function of around 4.03 eV, combining the high conductivity of Al with the stable interface of Ti, making it highly suitable for the electrodes of n-channel transistors. Diketopyrrolopyrrole (DPP)-based polymeric semiconductor transistors with Al/Ti electrodes result in a notable enhancement of the n-channel performance while also leading to a significant decrease in the p-channel properties. The transmission-line method (TLM) and low-frequency noise (LFN) techniques are employed to quantitatively evaluate the effects of Al/Ti electrodes on the charge injection of n-channel OFETs. Finally, complementary inverters composed of different electrodes (Au as a p-channel and Al/Ti as an n-channel electrode) are demonstrated. The inverters showed high static and dynamic characteristics such as ideal voltage transfer curves (VTCs) with minimal hysteresis, high gain (∼25), high noise margins (68%), and low static power consumption (19.9 μW).
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http://dx.doi.org/10.1021/acs.jpclett.4c03140 | DOI Listing |