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Power consumption is one of the most challenging bottlenecks for complementary metal-oxide-semiconductor integration. Negative-capacitance field-effect transistors (NC-FETs) offer a promising platform to break the thermionic limit defined by the Boltzmann tyranny and architect energy-efficient devices. However, it is a great challenge to achieving ultralow-subthreshold-swing (SS) (10 mV dec ) and small-hysteresis NC-FETs simultaneously at room temperature, which has only been reported using the hafnium zirconium oxide system. Here, based on a ferroelectric LiNbO thin film with great spontaneous polarization, an ultralow-SS NC-FET with small hysteresis is designed. The LiNbO NC-FET platform exhibits a record-low SS of 4.97 mV dec with great repeatability due to the superior capacitance matching characteristic as evidenced by the negative differential resistance phenomenon. By modulating the structure and operating parameters (such as channel length (L ), drain-sourse bias (V ), and gate bias (V )) of devices, an optimized SS from ≈40 to ≈10 mV dec and hysteresis from ≈900 to ≈60 mV are achieved simultaneously. The results provide a new potential method for future highly integrated electronic and optical integrated energy-efficient devices.
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http://dx.doi.org/10.1002/adma.202005353 | DOI Listing |
ACS Nano
May 2025
Department of Physics, Ewha Womans University, Seoul 03760, Republic of Korea.
Although negative capacitance field-effect transistors (NCFETs) have been extensively studied to overcome the fundamental Boltzmann limit, many prior reports on sub-60 mV/dec subthreshold swings (SS) suffer from inadequate data ranges, measurements near the noise floor, and a lack of robust device simulations, raising questions about the true efficacy of NCFETs. Moreover, recent efforts with MoS channels have frequently relied on mechanically exfoliated flakes, limiting device uniformity and scalability. Here, we present an NCFET that employs a synthetic monolayer MoS channel and a ferroelectric hafnium zirconium oxide layer in the gate stack integrated with indium metal contacts.
View Article and Find Full Text PDFAdv Mater
May 2025
School of Mechanical Engineering, Shanghai Jiao Tong University, Shanghai, 200240, China.
The relentless pursuit of miniaturization and reduced power consumption in information technology demands innovative device architectures. Negative capacitance field-effect transistors (NC-FETs) offer a promising solution by harnessing the negative capacitance effect of ferroelectric materials to amplify gate voltage and achieve steep subthreshold swings (SS). In this work, 2D van der Waals (vdW) ferroelectric CuCrPS (CCPS) is employed as the gate dielectric to realize hysteresis-free NC-FETs technology.
View Article and Find Full Text PDFMicromachines (Basel)
December 2024
State Key Laboratory of Wide-Bandgap Semiconductor Devices and lntegrated Technology, School of Microelectronics, Xidian University, Xi'an 710071, China.
This paper proposes and designs a silicon-based negative capacitance field effect transistor (NCFET) to replace conventional MOSFETs as the rectifying device in RF-DC circuits, aiming to enhance the rectification efficiency under low-power density conditions. By combining theoretical analysis with device simulations, the impacts of the ferroelectric material anisotropy, ferroelectric layer thickness, and active region doping concentration on the device performance were systematically optimized. The proposed NCFET structure is tailored for microwave wireless power transmission applications.
View Article and Find Full Text PDFNanomaterials (Basel)
December 2024
High-Power Converter Systems (HLU), Technical University of Munich (TUM), 80333 Munich, Germany.
In this paper, a new label-free DNA nanosensor based on a top-gated (TG) metal-ferroelectric-metal (MFM) graphene nanoribbon field-effect transistor (TG-MFM GNRFET) is proposed through a simulation approach. The DNA sensing principle is founded on the dielectric modulation concept. The computational method employed to evaluate the proposed nanobiosensor relies on the coupled solutions of a rigorous quantum simulation with the Landau-Khalatnikov equation, considering ballistic transport conditions.
View Article and Find Full Text PDFNano Lett
November 2024
Department of Materials Science and Engineering, Southern University of Science and Technology, Shenzhen 518055, Guangdong, China.
The emergence of 2D ferroelectrics, sliding ferroelectrics, and 2D ferroelectric semiconductors has greatly expanded the potential applications of two-dimensional ferroelectric field-effect transistors (2D FeFETs) in nonvolatile memory, neuromorphic synapses, and negative capacitance. However, the interaction between ferroelectric and semiconductor layers remains not well understood, and characterization methods to correlate carriers and polarization dynamics at the nanoscale are still lacking. Utilizing in situ scanning microwave impedance microscopy and piezoresponse force microscopy measurements, we employed a Pb(ZrTi)O/MoS-based 2D FeFET as an example to reveal, with high spatial resolution, the microscopic redistribution of carriers.
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