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This study describes a straightforward preparation of hybrid organic-inorganic thin films containing a stable 'sandwich'-like structure of two atomic layer deposited (ALD) ZnO layers separated by a thin organosilane phase, which is built from a single organic component (3-mercaptopropyl)trimethoxysilane (MPTMS). Grafting of MPTMS on the first ALD ZnO layer was performed in solution and driven by the strong affinity of the terminal thiol functionality (-SH) towards ZnO. We demonstrate that under different reaction conditions, either MPTMS monolayers are prepared or a 5 nm thick cross-linked polymeric network is formed due to the self-condensation of silane, which covers the ALD ZnO surface. This film served as a soft template for the nucleation of an ALD ZnO top layer by creation of S-Zn and Si-O-Zn bonds at the upper interface, as confirmed by XPS measurements. An increase in surface roughness, as compared to the initial ZnO film, is observed after removal of the organic layer from the hybrid structure by calcination, which is accompanied by an improvement in UVA photocatalytic activity towards the degradation of methyl orange dye. Thus, MPTMS can be used as a sacrificial agent in combination with low temperature ALD processes for building rougher and photocatalytically efficient ZnO coatings.
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http://dx.doi.org/10.1088/1361-6528/ab70ce | DOI Listing |
ACS Omega
August 2025
Dipartimento di Chimica, Università degli Studi "Aldo Moro" di Bari, Via Orabona, 4, Bari 70126, Italy.
This study presents hybrid sponges composed of zinc oxide and chitosan, engineered via atomic layer deposition (ALD), as highly efficient adsorbents for the removal of textile dyes from aqueous environments, including complex dye mixtures. ALD is a vapor-phase strategy to conformally deposit photocatalytically active zinc oxide within the porous chitosan matrix, enabling enhanced water stability and improved structural integrity. The main aim is to elucidate the influence of key physicochemical parameters on the adsorption process using Direct Blue-78 as a model dye.
View Article and Find Full Text PDFChem Mater
July 2025
Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands.
Area-selective atomic layer deposition (ALD) has gained widespread interest in the semiconductor industry to facilitate the continued drive for more powerful and efficient devices. In this work, we chemically passivate SiO with a single SF/H/Ar plasma pretreatment to selectively deposit TiO on ZnO, HfO, or AlO, using tetrakis-(dimethylamido)-titanium (TDMAT) and HO. The SF/(H + SF) flow ratio was tuned to suppress the etching of SiO while the nucleation delay of TiO ALD was maximized.
View Article and Find Full Text PDFACS Appl Mater Interfaces
July 2025
Department of Materials Science and Engineering, Southern University of Science and Technology, Shenzhen 518055, China.
Nucleation behavior governs the selectivity of area-selective atomic layer deposition (AS-ALD). Ideally, nontargeted regions should exhibit delayed nucleation or sparse nucleation that can be easily removed by post-treatment. Here, we report a burst nucleation phenomenon during AS-ALD on perfluoroalkyl self-assembled monolayer (SAM)-treated surfaces.
View Article and Find Full Text PDFMaterials (Basel)
July 2025
Deutsches Textilforschungszentrum Nord-West gGmbH, Adlerstr. 1, 47798 Krefeld, Germany.
Polyamide 6,6 (PA6,6) fabrics are widely used in textiles due to their high mechanical strength and chemical stability. However, their inherent flammability and melting behavior under fire pose significant safety challenges. In this study, a dual-layer flame-retardant system was developed by integrating atomic layer deposition (ALD) of ZnO with a phosphorus-silane-based flame retardant (DOPO-ETES).
View Article and Find Full Text PDFNanoscale
July 2025
Univ. Grenoble Alpes, CNRS, Grenoble INP, LMGP, 38000 Grenoble, France.
Open-air manufacture of functional nanolaminates demands rapid and scalable methods that maintain nanoscale precision across individual layers. Conventional spatial atomic layer deposition (SALD) employs a single deposition head, and the concurrent exposure to mutually reactive precursors does not provide precise layer thickness accuracy nor sharp interfaces. This work addresses these challenges with an innovative multi-head SALD design.
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