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The in situ fabrication of poly(ethylene glycol) diacrylate (PEGDA) hydrogel microstructures within poly(dimethylsiloxane) (PDMS)-based microfluidic networks is a versatile technique that has enabled unique applications in biosensing, medical diagnostics, and the fundamental life sciences. Hydrogel structures have previously been patterned by the lithographic photopolymerization of PEGDA hydrogel forming solutions, a process that is confounded by oxygen-permeable PDMS. Here, we introduce an alternate PEG patterning technique that relies upon the optical sculpting of features by patterned light-induced erosion of photodegradable PEGDA deemed negative projection lithography. We quantitatively compared the hydrogel micropatterning fidelity of negative projection lithography to positive projection lithography, using traditional PEGDA photopolymerization, within PDMS devices. We found that the channel depth, the local oxygen atmosphere, and the UV exposure time dictated the size and resolution of hydrogel features formed using positive projection lithography. In contrast, negative projection lithography was observed to deliver high-resolution functional features with dimensions on the order of single micrometers enabled by its facilely controlled mechanism of feature formation that is insensitive to oxygen. Next, the utility of photodegradable PEGDA was further assessed by encapsulating or conjugating bioactive molecules within photodegradable PEG matrixes to provide a route to the formation of complex and dynamically reconfigurable chemical microenvironments. Finally, we demonstrated that negative projection lithography enabled photopatterning of multilayered microscale objects without the need for precise mask alignment. The described approach for photopatterning high-resolution photolabile hydrogel microstructures directly within PDMS microchannels could enable novel microsystems of increasing complexity and sophistication for a variety of clinical and biological applications.
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http://dx.doi.org/10.1021/acsbiomaterials.8b00350 | DOI Listing |
Adv Healthc Mater
September 2025
Department of Mechanical Engineering, University of Arkansas, Fayetteville, AR, 72701, USA.
3D scaffold architecture is critical for directing human neural stem cell (hNSC) fate and spatial organization. In this study, two-photon lithography (TPL) is used to fabricate microcapillary scaffolds based on the Hilbert space-filling curve as biomimetic basement membrane structures for guiding hippocampal-derived hNSC differentiation. The scaffolds feature 80 µm lumens with porous ellipsoidal membranes suspended above the substrate to provide topographical cues and permit nutrient diffusion while maintaining mechanical stability.
View Article and Find Full Text PDFMicromachines (Basel)
July 2025
State Key Laboratory of Digital Manufacturing Equipment and Technology, School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China.
This review examines the design of thermal control systems for state-of-the-art deep ultraviolet (DUV) and extreme ultraviolet (EUV) projection lithography tools. The lithographic system under investigation integrates several critical subsystems along the optical transmission chain, including the light source, reticle stage, projection optics (featuring DUV refractive lenses and EUV multilayer mirrors), immersion liquid, wafer stage, and metrology systems. Under high-power irradiation conditions with concurrent thermal perturbations, the degradation of thermal stability and gradient uniformity within these subsystems significantly compromises exposure precision.
View Article and Find Full Text PDFOpt Express
June 2025
Surface plasmon lithography (SPL) overcomes the diffraction limit of conventional projection lithography by utilizing evanescent waves for imaging, offering significant potential for integrated circuit (IC) manufacturing at advanced technology nodes. Previous research on the imaging quality in SPL has primarily focused on enhancing the resolution of imaging structures, neglecting the compatibility with diverse mask patterns. Given the diversity and complexity of patterns in IC layouts, exploring imaging structures compatible with varied mask patterns is essential.
View Article and Find Full Text PDFMask aligner lithography does not rely on complex projection lens systems, offering a cost-effective and high-yield approach for chip manufacturing. However, its limited resolution restricts application in advanced chip manufacturing. Holographic lithography enhances lithographic resolution by introducing phase information onto the mask.
View Article and Find Full Text PDFAppl Opt
February 2025
Scanning technology is widely used in current lithography. During scanning, any point on the wafer scanning through the field of view (FOV) is successively affected by varying levels of polarization aberrations (PAs) that depend on the position within the FOV. However, current computational lithography studies for extreme ultraviolet lithography (EUVL) neglect this effect of the "dynamic PA" caused by scanning.
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