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3D printed microoptics have become important tools for miniature endoscopy, novel CMOS-based on-chip sensors, OCT-fibers, among others. Until now, only image quality and spot diagrams were available for optical characterization. Here, we introduce Ronchi interferometry as ultracompact and quick quantitative analysis method for measuring the wavefront aberrations after propagating coherent light through the 3D printed miniature optics. We compare surface shapes by 3D confocal microscopy with optical characterizations by Ronchi interferograms. Phase retrieval gives us the transversal wave front aberration map, which indicates that the aberrations of our microlenses that have been printed with a Nanoscribe GT or Quantum X printer exhibit RMS wavefront aberrations as small as λ/20, Strehl ratios larger than 0.91, and near-diffraction limited modulation transfer functions. Our method will be crucial for future developments of 3D printed microoptics, as the method is ultracompact, ultra-stable, and very fast regarding measurement and evaluation. It could fit directly into a 3D printer and allows for in-situ measurements right after printing as well as fast iterations for improving the shape of the optical surface.
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http://dx.doi.org/10.1364/OE.516962 | DOI Listing |
3D printed microoptics have become important tools for miniature endoscopy, novel CMOS-based on-chip sensors, OCT-fibers, among others. Until now, only image quality and spot diagrams were available for optical characterization. Here, we introduce Ronchi interferometry as ultracompact and quick quantitative analysis method for measuring the wavefront aberrations after propagating coherent light through the 3D printed miniature optics.
View Article and Find Full Text PDFDouble-Ronchi shearing interferometry is widely used in wavefront aberration measurements for advanced lithography projection lens systems. A rigorous simulation model of double-Ronchi shearing interferometry on lithographic tools is the precondition for phase-shifting retrieval algorithm design and error analysis. This paper presents a rigorous simulation model of double-Ronchi shearing interferometry considering the vector nature of light.
View Article and Find Full Text PDFThe Ronchi test is widely used for wavefront measurements in advanced lithography tools, and a physical optics explanation of the Ronchi test based on scalar diffraction theory can be found in numerous publications. However, for high-numerical aperture (high-NA) lithography projection lenses, the vector nature of light should be considered when performing wavefront measurements, especially the effect of polarization aberrations on the wavefront test results. In this paper, a vector model for describing shearing interferometry for high-NA lithography projection lenses is established.
View Article and Find Full Text PDFDouble-Ronchi shearing interferometry is a promising wavefront aberration measurement system for advanced lithography projection lens systems. The image grating defocusing is a key systematic error of the interferometer. However, the effects and elimination of this error have not been systematically researched.
View Article and Find Full Text PDF