98%
921
2 minutes
20
Electrocatalytic nitrogen reduction (eNRR) offers a green pathway for the production of NH from N and HO under ambient conditions. Transition metal oxynitrides (TMO N ) are among the most promising catalysts but face challenges in achieving a high yield and faradaic efficiency (FE). This work develops a hybrid WO N /WO catalyst with a unique heterogeneous interfacial complexion (HIC) structure. This design enables generation and delivery of highly active hydrogen atoms (H*) in acidic electrolytes, promoting nitrogen hydrogenation and the formation of nitrogen vacancies (Nv) on the WO N surface. This significantly enhances the selectivity of eNRR for NH synthesis while suppressing the hydrogen evolution reaction (HER). A simple two-step fabrication processmicrowave hydrothermal growth followed by plasma-assisted surface nitridationwas developed to fabricate the designed catalyst electrode, achieving an NH yield of 3.2 × 10 mol·cm·s with 40.1% FE, outperforming most TMN/TMO N electrocatalysts. Multiple control experiments confirm that the eNRR follows an HIC-enhanced Mars-van Krevelen (MvK) mechanism.
Download full-text PDF |
Source |
---|---|
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC12333582 | PMC |
http://dx.doi.org/10.1021/acsenergylett.5c01034 | DOI Listing |
Molecules
August 2025
Complex of Crystallography and Photonics, National Research Centre "Kurchatov Institute", 119333 Moscow, Russia.
The search for a simple, scalable, and eco-friendly method for synthesizing micro-sized photocatalysts is an urgent task. Plasma technologies are highly effective and have wide possibilities for targeted synthesis of novel materials. The mass-average temperature of plasma treatment is higher than the stability temperature of anatase and brookite, the most photoactive polymorphs of titanium dioxide.
View Article and Find Full Text PDFNanomaterials (Basel)
July 2025
School of Nano Convergence Technology, Hallym University, Chuncheon 24252, Republic of Korea.
This study presents a photoresist-free patterning method for solution-processed indium zinc oxide (IZO) thin films using two photochemical exposure techniques, namely pulsed ultraviolet (UV) light and UV-ozone, and a plasma-based method using oxygen (O) plasma. Pulsed UV light delivers short, high-intensity flashes of light that induce localised photochemical reactions with minimal thermal damage, whereas UV-ozone enables smooth and uniform surface oxidation through continuous low-pressure UV irradiation combined with in situ ozone generation. By contrast, O plasma generates ionised oxygen species via radio frequency (RF) discharge, allowing rapid surface activation, although surface damage may occur because of energetic ion bombardment.
View Article and Find Full Text PDF(Sr, Ca)AlSiN:Eu (SCASN) phosphors are widely applied in white LEDs to enhance the red spectral component, thereby improving spectral coverage and potentially contributing to a higher color rendering index. However, the rapid degradation of SCASN phosphors under highly thermal and thermal-humidity conditions restricts broader application. In this study, silica-coated SCASN phosphors were prepared via rapid plasma-assisted film deposition.
View Article and Find Full Text PDFACS Energy Lett
July 2025
Department of Chemistry, Rutgers, the State University of New Jersey, Newark, New Jersey 07102, United States.
Electrocatalytic nitrogen reduction (eNRR) offers a green pathway for the production of NH from N and HO under ambient conditions. Transition metal oxynitrides (TMO N ) are among the most promising catalysts but face challenges in achieving a high yield and faradaic efficiency (FE). This work develops a hybrid WO N /WO catalyst with a unique heterogeneous interfacial complexion (HIC) structure.
View Article and Find Full Text PDFACS Appl Mater Interfaces
August 2025
Oregon State University, Corvallis, Oregon 97333, United States.
Development of efficient metal deposition methods for patterning and depositing metal structures is crucial for advancing electronics manufacturing. Existing multistep processes that require separate equipment for each step hinder the progress of scalable and rapid metal deposition techniques. Plasma jet printing (PJP) is an advanced printing technique that has the capability to deposit plasma-assisted sintered metal traces with improved adhesion with the help of a dielectric discharge plasma.
View Article and Find Full Text PDF