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Article Abstract
Many fields in science and industry rely on the advances of nanofabrication processes. However, well-established techniques, such as electron beam lithography, might pose restrictions on dielectric materials due to surface charging effects. We propose using pulsed thermal scanning probe lithography to directly assemble high resolution patterns on insulating substrates. We applied this methodology to meet the requirements of fabricating all-dielectric metasurfaces. The pulsed thermal scanning probe lithography process, operating in standard room conditions, provided sub-10nm resolution for patterning on silica without the need of any additional conductive layers. Thus, the proposed technique improves material compatibility for nanofabrication and consequently enables the exploration of dielectric material properties across a wide range of devices.
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| http://www.ncbi.nlm.nih.gov/pmc/articles/PMC12223189 | PMC |
| http://dx.doi.org/10.1038/s41598-025-07428-1 | DOI Listing |
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