Severity: Warning
Message: file_get_contents(https://...@gmail.com&api_key=61f08fa0b96a73de8c900d749fcb997acc09&a=1): Failed to open stream: HTTP request failed! HTTP/1.1 429 Too Many Requests
Filename: helpers/my_audit_helper.php
Line Number: 197
Backtrace:
File: /var/www/html/application/helpers/my_audit_helper.php
Line: 197
Function: file_get_contents
File: /var/www/html/application/helpers/my_audit_helper.php
Line: 271
Function: simplexml_load_file_from_url
File: /var/www/html/application/helpers/my_audit_helper.php
Line: 3165
Function: getPubMedXML
File: /var/www/html/application/controllers/Detail.php
Line: 597
Function: pubMedSearch_Global
File: /var/www/html/application/controllers/Detail.php
Line: 511
Function: pubMedGetRelatedKeyword
File: /var/www/html/index.php
Line: 317
Function: require_once
98%
921
2 minutes
20
Tungsten diselenide (WSe) monolayers under strain are promising hosts for quantum emitters. To date, WSe quantum emitter strain engineering has focused primarily on draping WSe monolayers on patterned substrates and nanoindentation, which suffer from poor control over strain. In this work, we employ an electrostatic approach to dynamically control tensile strain in monolayer WSe suspended over micron-scale cavities with a back gate contact. Room-temperature measurement of electrostatically induced deflection and photoluminescence at = 100 K shows that a 0.22-0.26% increase in tensile strain can be achieved at modest gate voltages. Sharp localized emitters showed improvement in single photon purity from g(0) = 0.55 ± 0.04 at 0 V to g(0) = 0.40 ± 0.05 at -30 V due to strain-induced alignment of defect and dark exciton states and classical light background suppression.
Download full-text PDF |
Source |
---|---|
http://dx.doi.org/10.1021/acs.nanolett.5c02619 | DOI Listing |