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Interfacial engineering of BiMoO/TiC Schottky junctions based on work function for efficient photoexcitation-assisted degradation of antibiotics. | LitMetric

Interfacial engineering of BiMoO/TiC Schottky junctions based on work function for efficient photoexcitation-assisted degradation of antibiotics.

J Hazard Mater

State Key Laboratory of Pollution Control and Resources Reuse, Shanghai Institute of Pollution Control and Ecological Security, College of Environmental Science and Engineering, Tongji University, Shanghai 200092, China. Electronic address:

Published: August 2025


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Article Abstract

The efficient removal of tetracycline (TC) while minimizing the formation of toxic intermediates remains a significant challenge. In this study, an interfacial Schottky junction of BiMoO/TiC(BMT) was designed, generated by the contact potential difference between TiC and BiMoO (BMO). The induction of work function and Fermi energy level was observed to generate a localized electrophilic/nucleophilic region that promotes the formation of free radicals. Self-driven charge transfer across the interface was found to increase the localized electron density on TiC, while the formation of Schottky barriers was observed to inhibit electron return and facilitate charge transfer and separation. The photocatalytic activity of BMT-5 under visible and near-infrared light radiation was significantly enhanced, resulting in an increased free radical content, which was identified using the probe method. With the assistance of LSPR and oxygen vacancies, BMT-5 achieved a removal efficiency of 99 % for tetracycline within 15 minutes, with a substantial reduction in the toxicity of the resulting intermediates. This study offers an innovative strategy for constructing electronic bridges in Schottky photocatalysts to enhance photocatalytic activity.

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http://dx.doi.org/10.1016/j.jhazmat.2025.138801DOI Listing

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