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Laterally Ordered Sub-10 nm Features Obtained From Directed Self-Assembly of Si-Containing Block Copolymer Thin Films. | LitMetric

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Article Abstract

Laterally ordered sub-10 nm features are produced from the directed self-assembly of poly(1,1-dimethyl silacyclo-butane)-block-poly(methyl methacrylate) (PDMSB-b-PMMA) thin films on sinusoidal azobenzene-containing patterns. The use of sinusoidal surface relief grating enables the formation of very large grain areas (over several µm(2) ) consisting of out-of-plane PMMA cylinders.

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http://dx.doi.org/10.1002/smll.201500439DOI Listing

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