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Due to the exceptional physical and chemical properties, vanadium nitride (VN) films exhibit significant potential for a wide range of applications. However, their non-layered structure has hindered their integration into two-dimensional nano-electronic devices, primarily due to the challenges associated with synthesizing well-defined 2D films. This study proposed an efficient method for the synthesis of 2D vanadium nitride films through a two-step growth process that combines chemical vapor deposition with atomic substitution.

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