Influence of SiO Nanoparticles Extracted from Biomass on the Properties of Electrodeposited Ni Matrix Composite Films on Si(100) Substrate.

Materials (Basel)

"VINČA" Institute of Nuclear Sciences-National Institute of the Republic of Serbia, Department of Chemical Dynamics, and Permanent Education, University of Belgrade, Mike Petrovića Alasa, 11 000 Belgrade, Serbia.

Published: August 2024


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Article Abstract

Lab-made biosilica (SiO) nanoparticles were obtained from waste biomass (rice husks) and used as eco-friendly fillers in the production of nickel matrix composite films via the co-electrodeposition technique. The produced biosilica nanoparticles were characterized using XRD, FTIR, and FE-SEM/EDS. Amorphous nano-sized biosilica particles with a high SiO content were obtained. Various current regimes of electrodeposition, such as direct current (DC), pulsating current (PC), and reversing current (RC) regimes, were applied for the fabrication of Ni and Ni/SiO films from a sulfamate electrolyte. Ni films electrodeposited with or without 1.0 wt.% biosilica nanoparticles in the electrolyte were characterized using FE-SEM/EDS (morphology/elemental analyses, roundness), AFM (roughness), Vickers microindentation (microhardness), and sheet resistance. Due to the incorporation of SiO nanoparticles, the Ni/SiO films were coarser than those obtained from the pure sulfamate electrolyte. The addition of SiO to the sulfamate electrolyte also caused an increase in the roughness and electrical conductivity of the Ni films. The surface roughness values of the Ni/SiO films were approximately 44.0%, 48.8%, and 68.3% larger than those obtained for the pure Ni films produced using the DC, PC, and RC regimes, respectively. The microhardness of the Ni and Ni/SiO films was assessed using the Chen-Gao (C-G) composite hardness model, and it was shown that the obtained Ni/SiO films had a higher hardness than the pure Ni films. Depending on the applied electrodeposition regime, the hardness of the Ni films increased from 29.1% for the Ni/SiO films obtained using the PC regime to 95.5% for those obtained using the RC regime, reaching the maximal value of 6.880 GPa for the Ni/SiO films produced using the RC regime.

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http://www.ncbi.nlm.nih.gov/pmc/articles/PMC11356421PMC
http://dx.doi.org/10.3390/ma17164138DOI Listing

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