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Self-consistent charge density functional tight-binding (DFTB) calculations have been performed to investigate the electrical properties and transport behavior of asymmetric graphene devices (AGDs). Three different nanodevices constructed of different necks of 8 nm, 6 nm and 4 nm, named Graphene-N8, Graphene-N6 and Graphene-N4, respectively, have been proposed. All devices have been tested under two conditions of zero gate voltage and an applied gate voltage of +20 V using a dielectric medium of 3.9 epsilon interposed between the graphene and the metallic gate. As expected, the results of AGD diodes exhibited strong asymmetric () characteristic curves in good agreement with the available experimental data. Our predictions implied that Graphene-N4 would achieve great asymmetry () of 1.40 at || = 0.2 V with maximum transmittance () of 6.72 in the energy range 1.30 eV. More importantly, while the of Graphene-N4 was slightly changed by applying the gate voltage, Graphene-N6/Graphene-N8 showed a significant effect with their increased from 1.20/1.03 under no gate voltage (NGV) to 1.30/1.16 under gate voltage (WGV) conditions. Our results open up unprecedented numerical prospects for designing tailored geometric diodes.
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http://dx.doi.org/10.1039/d3na00603d | DOI Listing |
ACS Appl Mater Interfaces
September 2025
National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan.
In this study, we analyze InO thin-film transistors (InO-TFT) using synchrotron-based hard X-ray photoelectron spectroscopy (HAXPES) in conditions. A bottom-gate InO-TFT with a high- AlO gate dielectric, grown on thermally oxidized silicon (SiO/p-Si), was examined while operating at varying and . The results reveal that the In 3d core level binding energy varies along the horizontal channel length, driven by the potential gradient induced by .
View Article and Find Full Text PDFAdv Mater
September 2025
State Key Laboratory of Fabrication Technologies for Integrated Circuits, Chinese Academy of Sciences, Beijing, 100029, China.
The monolayer transistor, where the semiconductor layer is a single molecular layer, offers an ideal platform for exploring transport mechanisms both theoretically and experimentally by eliminating the influence of spatially correlated microstructure. However, the structure-property relations in polymer monolayers remain poorly understood, leading to low transistor performance to date. Herein, a self-confinement effect is demonstrated in the polymer monolayer with nanofibrillar microstructures and edge-on orientation, as characterized by the 4D scanning confocal electron diffraction method.
View Article and Find Full Text PDFACS Nano
September 2025
School of Microelectronics, University of Science and Technology of China, Hefei, Anhui 230026, China.
Superlinear photodetectors hold significant potential in intelligent optical detection systems, such as near-field imaging. However, their current realization imposes stringent requirements on photosensitive materials, thereby limiting the flexibility of the device integration for practical applications. Herein, a tunable superlinear GaO deep-ultraviolet gate-all-around (GAA) phototransistor based on a p-n heterojunction has been proposed.
View Article and Find Full Text PDFACS Nano
September 2025
Department of Chemical Engineering, Stanford University, Stanford, California 94305, United States.
Integration of ultrathin, high-quality gate insulators is critical to the success of two-dimensional (2D) semiconductor transistors in next-generation nanoelectronics. Here, we investigate the impact of atomic layer deposition (ALD) precursor choice on the nucleation and growth of insulators on monolayer MoS. Surveying a series of aluminum (AlO) precursors, we observe that increasing the length of the ligands reduces the nucleation delay of alumina on monolayer MoS, a phenomenon that we attribute to improved van der Waals dispersion interactions with the 2D material.
View Article and Find Full Text PDFElife
September 2025
Department of Chemistry, University of Massachusetts, Amherst, United States.
Voltage-dependence gating of ion channels underlies numerous physiological and pathophysiological processes, and disruption of normal voltage gating is the cause of many channelopathies. Here, long timescale atomistic simulations were performed to directly probe voltage-induced gating transitions of the big potassium (BK) channels, where the voltage sensor domain (VSD) movement has been suggested to be distinct from that of canonical Kv channels but remains poorly understood. Using a Core-MT construct without the gating ring, multiple voltage activation transitions were observed at 750 mV, allowing detailed analysis of the activated state of BK VSD and key mechanistic features.
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