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Aligned silicon carbide nanowire crossed nets with high superhydrophobicity. | LitMetric

Aligned silicon carbide nanowire crossed nets with high superhydrophobicity.

Langmuir

School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai, 200240, People's Republic of China.

Published: June 2008


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Article Abstract

Aligned silicon carbide nanowire crossed nets (a-SiCNWNs) were directly synthesized by using a vapor-solid reaction at 1100 degrees C. Zinc sulfide was used as catalyst to assist the growth of a-SiCNWNs with small size and crystal structure. After functionalization with perfluoroalkysilane, a-SiCNWNs showed excellent superhydrophobic property with a high water contact angle more than 156 +/- 2 degrees , compared to random nanowires (147 +/- 2 degrees ) and pure silicon wafers (101 +/- 2 degrees ). The topographic roughness and chemical modification with CF 2/CF 3 groups contributed the better superhydrophobicity. Furthermore, the as-grown SiCNWNs can be scraped off and coated on other substrates such as pure silicon wafers. The novel nanowire coating with good superhydrophobicity displays extensive applications in silicon-related fields such as solar cells, radar, etc.

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Source
http://dx.doi.org/10.1021/la800494hDOI Listing

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