Chem Commun (Camb)
March 2025
Correction for 'HfO-based ferroelectric synaptic devices: challenges and engineering solutions' by Taegyu Kwon , , 2025, , 3061-3080, https://doi.org/10.1039/d4cc05293e.
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February 2025
HfO-based ferroelectric memories have garnered significant attention for their potential to serve as artificial synaptic devices owing to their scalability and CMOS compatibility. This review examines the key material properties and challenges associated with HfO-based ferroelectric artificial synaptic devices as well as the recent advancements in engineering strategies to improve their synaptic performance. The fundamental physics and material properties of HfO-based ferroelectrics are reviewed to understand the theoretical origin of the aforementioned technical issues in ferroelectric HfO-based synaptic devices.
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