Publications by authors named "Djallel Eddine Touaibia"
This work uses the direct current magnetron sputtering (DCMS) of equi-atomic (AlTiZrHfTa) and Si targets in dynamic sweep mode to deposit nano-layered (AlTiZrHfTa)N/SiN refractory high-entropy coatings (RHECs). Transmission electron microscopy (TEM), field emission scanning electron microscopy (FESEM), thermogravimetric analysis (TGA), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS) are used to investigate the effect of Si addition on the oxidation behavior of the nano-layered coatings. The Si-free nitride coating exhibits FCC structure and columnar morphology, while the Si-doped nitride coatings present a FCC (AlTiZrHfTa)N/amorphous-SiN nano-layered architecture.
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- The article discusses the effects of nitrogen content on the structural and mechanical properties of AlTiZrTaHf high entropy films, which were created using a technique called reactive magnetron sputtering.
- X-ray photoelectron spectroscopy (XPS) measurements were performed to analyze the composition of the films, revealing the presence of nitrides and oxides at the surface.
- The study shows that as the nitrogen flow rate increases, the amount of nitrogen in the films rises while the metallic fractions decrease, highlighting the nitridation behavior of the different elements in the films.